₺3,000 10-30 nm; Priced over 1 wafer Al2O3 coating on Si wafer surface quantity Add to cart Description Description Service Device/System: Spatial Atomic Layer Deposition (ALD) system for passivation of Alumina (Al2O3) Related products Production of thin film Si on Si wafer ₺140,000 SIPV Production of thin film Si on Si wafer quantity Add to cart Oxidation of Si surface by thermal method ₺10,000 SIPV Oxidation of Si surface by thermal method quantity Add to cart Si surface cleaning or similar chemical process ₺10,000 SIPV Si surface cleaning or similar chemical process quantity Add to cart B, P, H, F implantation processes ₺20,000 SIPV B, P, H, F implantation processes quantity Add to cart
Description Service Device/System: Spatial Atomic Layer Deposition (ALD) system for passivation of Alumina (Al2O3)