₺2,000 Thinner than 10 nm; Priced over 1 wafer Al2O3 coating on Si wafer surface quantity Add to cart Description Description Service Device/System: Spatial Atomic Layer Deposition (ALD) system for passivation of Alumina (Al2O3) Related products Cluster device for heterojunction and thin-film Si cell production ₺6,000 SIPV Cluster device for heterojunction and thin-film Si cell production quantity Add to cart Al2O3 coating on Si wafer surface ₺4,000 SIPV Al2O3 coating on Si wafer surface quantity Add to cart Production of thin film Si on Si wafer ₺140,000 SIPV Production of thin film Si on Si wafer quantity Add to cart Ni/Cu/Ag coating on Si slice surface ₺20,000 SIPV Ni/Cu/Ag coating on Si slice surface quantity Add to cart
Description Service Device/System: Spatial Atomic Layer Deposition (ALD) system for passivation of Alumina (Al2O3)