₺10,000 Priced over 10 wafers Boron (B) or Phosphorus (P) doping process quantity Add to cart Description Description Service Device/System: Diffusion furnaces for full-area p and n-type doping Related products Cluster device for heterojunction and thin-film Si cell production ₺3,000 SIPV Cluster device for heterojunction and thin-film Si cell production quantity Add to cart Silver and/or Al imprinting on the Si surface ₺15,000 SIPV Silver and/or Al imprinting on the Si surface quantity Add to cart SixNy and SiOxNy coating on Si surface ₺50,000 SIPV SixNy and SiOxNy coating on Si surface quantity Add to cart Production of thin film Si on Si wafer ₺70,000 SIPV Production of thin film Si on Si wafer quantity Add to cart