₺8,000 hour Process of scratching thin films quantity Add to cart Description Description Service Device/System: Nano-second laser for scratching thin films Related products Production of thin film Si on Si wafer ₺100,000 SIPV Production of thin film Si on Si wafer quantity Add to cart Boron (B) or Phosphorus (P) doping process ₺20,000 SIPV Boron (B) or Phosphorus (P) doping process quantity Add to cart Ni/Cu/Ag coating on Si slice surface ₺20,000 SIPV Ni/Cu/Ag coating on Si slice surface quantity Add to cart Oxidation of Si surface by thermal method ₺10,000 SIPV Oxidation of Si surface by thermal method quantity Add to cart
