₺4,000 unit Surface texturing quantity Add to cart Description Description Service Device/System: Reactive Ion Etching (RIE) device Related products Boron (B) or Phosphorus (P) doping process ₺10,000 SIPV Boron (B) or Phosphorus (P) doping process quantity Add to cart Boron (B) or Phosphorus (P) doping process ₺15,000 SIPV Boron (B) or Phosphorus (P) doping process quantity Add to cart All the processes ₺40,000 SIPV All the processes quantity Add to cart Removing the SixNy layer from the Si surface by scratching ₺15,000 SIPV Removing the SixNy layer from the Si surface by scratching quantity Add to cart
