₺30,000 Priced over 10 wafers Boron (B) or Phosphorus (P) doping process quantity Add to cart Description Description Service Device/System: Low-pressure doping furnace Related products Production of thin film Si on Si wafer ₺100,000 SIPV Production of thin film Si on Si wafer quantity Add to cart SixNy and SiOxNy coating on Si surface ₺100,000 SIPV SixNy and SiOxNy coating on Si surface quantity Add to cart All the processes ₺80,000 SIPV All the processes quantity Add to cart Oxidation of Si surface by thermal method ₺10,000 SIPV Oxidation of Si surface by thermal method quantity Add to cart
