Service Device/System: Diffusion furnaces for full-area p and n-type doping
Priced over 10 wafers
Service List
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Boron (B) or Phosphorus (P) doping process
₺20,000 -
Ni/Cu/Ag coating on Si slice surface
₺20,000Service Device/System: Electroplating
wafer
-
Coating process by sputtering
₺4,000Service Device/System: Sputter coating system
Excluding metal price; unit
-
Al2O3 coating on Si wafer surface
₺2,000Service Device/System: Spatial Atomic Layer Deposition (ALD) system for passivation of Alumina (Al2O3)
Thinner than 10 nm; Priced over 1 wafer
-
All the processes
₺80,000Service Device/System: PERC cell production
Priced over 10 wafers
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Metal film production
₺8,000Service Device/System: Electron beam evaporation system
Excluding metal price; unit
-
Al2O3 coating on Si wafer surface
₺3,000Service Device/System: Spatial Atomic Layer Deposition (ALD) system for passivation of Alumina (Al2O3)
10-30 nm; Priced over 1 wafer
-
Si surface cleaning or similar chemical process
₺10,000Service Device/System: Wet benches for cleaning and similar chemical process
RCA-1, RCA-2 processes (including wafer); Priced over 25 wafers
-
Cutting, drilling, marking processes
₺6,000Service Device/System: Marking laser
hour
-
Al2O3 coating on Si wafer surface
₺4,000Service Device/System: Spatial Atomic Layer Deposition (ALD) system for passivation of Alumina (Al2O3)
Thicker than 30 nm; Priced over 1 wafer
-
Boron (B) or Phosphorus (P) doping process
₺30,000Service Device/System: Low-pressure doping furnace
Priced over 10 wafers
-
Several annealing processes
₺8,000Service Device/System: Annealing furnaces
hour
-
SixNy and SiOxNy coating on Si surface
₺100,000Service Device/System: PECVD for dielectric (SixNy and SiOxNy) coating processes
Thinner than 100 nm; Priced over 20 wafers
-
Oxidation of Si surface by thermal method
₺10,000Service Device/System: Oxidation furnace
Priced over 10 wafers
-
Wet and dry oxidation processes
₺8,000Service Device/System: Oxidation furnaces
hour
-
SixNy and SiOxNy coating on Si surface
₺140,000Service Device/System: PECVD for dielectric (SixNy and SiOxNy) coating processes
100-200 nm; Priced over 20 wafers
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Transferring shapes to any surface
₺10,000Service Device/System: Mask alignment/ lithography system
hour
-
Coating processes
₺4,000Service Device/System: Spin coater system
hour
-
SixNy and SiOxNy coating on Si surface
₺100,000Service Device/System: PECVD for dielectric (SixNy and SiOxNy) coating processes
Thicker than 200 nm; Priced over 20 wafers
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Cluster device for heterojunction and thin-film Si cell production
₺6,000Service Device/System: Cluster device for heterojunction and thin-film Si cell production
i-amorphous Si coating; unit
-
Several chemical processes
₺6,000Service Device/System: Wet benches
hour
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Solar Cell efficiency measurement under flash light
₺800Service Device/System : Flash Solar Simulator (Class AAA)
Brand-Model of Service Device/System Type: Quicksun/ 120CA-XL
Description: It is used to determine the basic parameters of solar cells such as FF, Jsc, Voc using the flash method.
unit
-
Production of thin film Si on Si wafer
₺100,000Service Device/System: Production of thin film Si by LPCVD
Thinner than 100 nm; Priced over 20 wafers
-
Cluster device for heterojunction and thin-film Si cell production
₺8,000Service Device/System: Cluster device for heterojunction and thin-film Si cell production
n-amorphous Si coating; unit
-
Annealing processes
₺4,000Service Device/System: Furnaces
hour
-
Production of thin film Si on Si wafer
₺140,000Service Device/System: Production of thin film Si by LPCVD
100-200 nm; Priced over 20 wafers
-
Cluster device for heterojunction and thin-film Si cell production
₺8,000Service Device/System: Cluster device for heterojunction and thin-film Si cell production
p-amorphous Si coating; unit
-
Thermophysical property measurement at room temperature with the transient plane source method
₺1,000Service Device/System : Hot Disk
Brand-Model of Service Device/System Type: TPS 2500 S
Description: Thermal conductivity, thermal diffusivity, thermal effusivity and specific heat capacity of materials at room temperature are measured by Transient Plane Source (TPS), which is a standardized method in ISO22007-2.
unit
-
Production of thin film Si on Si wafer
₺200,000Service Device/System: Production of thin film Si by LPCVD
Thicker than 200 nm; Priced over 20 wafers
-
Cluster device for heterojunction and thin-film Si cell production
₺2,000Service Device/System: Cluster device for heterojunction and thin-film Si cell production
ITO coating; unit
-
Thermophysical property measurement at high temperatures with the transient plane source method
₺1,000Service Device/System : Hot Disk
Brand-Model of Service Device/System Type: TPS 2500 S
Description: Thermal conductivity, thermal diffusivity, thermal effusivity and specific heat capacity of materials up to 400°C are measured by Transient Plane Source (TPS), which is a standardized method in ISO22007-2.
unit
-
Removing the SixNy layer from the Si surface by scratching
₺30,000Service Device/System: Picosecond laser for contact opening and material removal/cutting
hour
-
Cluster device for heterojunction and thin-film Si cell production
₺20,000Service Device/System: Cluster device for heterojunction and thin-film Si cell production
Production of a complete heterojunction cell; unit
-
Implementation of the PTC simulator as a benchmark for industrial applications
Service Device/System : PTC Simulator
Brand-Model of Service Device/System Type: Novel Design
Description: Thermal oil is heated using electrical resistance and circulates in a closed system at a certain temperature. In industrial applications requiring thermal energy such as distillation, drying, evaporation, the performance of the industrial application is measured by making the necessary modifications according to the application. Priced according to the application to be used.
unit
-
Thin film and surface sensitive material content and directional phase measurement
₺2,000Service Device/System: Grazing incidence X-ray diffraction (GIXRD)
Brand-Model of Service Device/System Type: Rigaku
unit
-
Silver and/or Al imprinting on the Si surface
₺26,000Service Device/System: Firing process by a conveyor belt furnace
Silver print; 10 wafers
-
Surface texturing
₺8,000Service Device/System: Reactive Ion Etching (RIE) device
unit
-
18 kWe Solar Simulator use for concentrated solar energy applications
Service Device/System : Solar Simulator
Brand-Model of Service Device/System Type: Novel Design
Description: Using a solar simulator with 3 Xenon lamps, each with 6 kWe power, experiments are carried out according to the desired concentrated solar application and the performance of the application is evaluated. Priced according to the application to be used.
unit
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Outdoor tests of photovoltaic modules
₺9,000Service Device/System: PV Analyzer
Brand-Model of Service Device/System Type: Daystar Multi Tracer MT5
Description: Short- or long-term outdoor performance tests and analyses of photovoltaic mini-modules and modules are conducted and reported.
month
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Silver and/or Al imprinting on the Si surface
₺20,000Service Device/System: Firing process by a conveyor belt furnace
Al print; 10 wafers