Service Device/System: PECVD for dielectric (SixNy and SiOxNy) coating processes
Thinner than 100 nm; Priced over 20 wafers
Service Device/System: PECVD for dielectric (SixNy and SiOxNy) coating processes
Thinner than 100 nm; Priced over 20 wafers
Service Device/System: Oxidation furnace
Priced over 10 wafers
Service Device/System: Oxidation furnaces
hour
Service Device/System: PECVD for dielectric (SixNy and SiOxNy) coating processes
100-200 nm; Priced over 20 wafers
Service Device/System: Mask alignment/ lithography system
hour
Service Device/System: Spin coater system
hour
Service Device/System: PECVD for dielectric (SixNy and SiOxNy) coating processes
Thicker than 200 nm; Priced over 20 wafers
Service Device/System: Cluster device for heterojunction and thin-film Si cell production
i-amorphous Si coating; unit
Service Device/System: Wet benches
hour
Service Device/System : Flash Solar Simulator (Class AAA)
Brand-Model of Service Device/System Type: Quicksun/ 120CA-XL
Description: It is used to determine the basic parameters of solar cells such as FF, Jsc, Voc using the flash method.
unit
Service Device/System: Production of thin film Si by LPCVD
Thinner than 100 nm; Priced over 20 wafers
Service Device/System: Cluster device for heterojunction and thin-film Si cell production
n-amorphous Si coating; unit
Service Device/System: Furnaces
hour
Service Device/System: Production of thin film Si by LPCVD
100-200 nm; Priced over 20 wafers
Service Device/System: Cluster device for heterojunction and thin-film Si cell production
p-amorphous Si coating; unit
Service Device/System : Hot Disk
Brand-Model of Service Device/System Type: TPS 2500 S
Description: Thermal conductivity, thermal diffusivity, thermal effusivity and specific heat capacity of materials at room temperature are measured by Transient Plane Source (TPS), which is a standardized method in ISO22007-2.
unit
Service Device/System: Production of thin film Si by LPCVD
Thicker than 200 nm; Priced over 20 wafers
Service Device/System: Cluster device for heterojunction and thin-film Si cell production
ITO coating; unit
Service Device/System : Hot Disk
Brand-Model of Service Device/System Type: TPS 2500 S
Description: Thermal conductivity, thermal diffusivity, thermal effusivity and specific heat capacity of materials up to 400°C are measured by Transient Plane Source (TPS), which is a standardized method in ISO22007-2.
unit
Service Device/System: Picosecond laser for contact opening and material removal/cutting
hour
Service Device/System: Cluster device for heterojunction and thin-film Si cell production
Production of a complete heterojunction cell; unit
Service Device/System : PTC Simulator
Brand-Model of Service Device/System Type: Novel Design
Description: Thermal oil is heated using electrical resistance and circulates in a closed system at a certain temperature. In industrial applications requiring thermal energy such as distillation, drying, evaporation, the performance of the industrial application is measured by making the necessary modifications according to the application. Priced according to the application to be used.
unit
Service Device/System: Grazing incidence X-ray diffraction (GIXRD)
Brand-Model of Service Device/System Type: Rigaku
unit
Service Device/System: Firing process by a conveyor belt furnace
Silver print; 10 wafers
Service Device/System: Reactive Ion Etching (RIE) device
unit
Service Device/System : Solar Simulator
Brand-Model of Service Device/System Type: Novel Design
Description: Using a solar simulator with 3 Xenon lamps, each with 6 kWe power, experiments are carried out according to the desired concentrated solar application and the performance of the application is evaluated. Priced according to the application to be used.
unit
Service Device/System: PV Analyzer
Brand-Model of Service Device/System Type: Daystar Multi Tracer MT5
Description: Short- or long-term outdoor performance tests and analyses of photovoltaic mini-modules and modules are conducted and reported.
month
Service Device/System: Firing process by a conveyor belt furnace
Al print; 10 wafers
Service Device/System: Oxygen plasma system
unit
Service Device/System: Thermal Camera
Brand-Model of Service Device/System Type: Flir T530
Description: Thermal imaging of photovoltaic systems or electrical equipment/panels is conducted and reported.
max. 50 unit/day
Service Device/System: Firing process by a conveyor belt furnace
Silver and Al print together; 10 wafers
Service Device/System: E-beam evaporation system for Si or Ge coating
unit
Service Device/System: Fully automatic wet benches for Si wafer patterning and contact isolation
1-100 units (including wafer); Priced over 50 wafers
Service Device/System: Ion implantation process
Process for 1 element; Priced over 3 wafers
Service Device/System: Nano-second laser for scratching thin films
hour
Service Device/System: Fully automatic wet benches for Si wafer patterning and contact isolation
100 units and above (including slice); Priced over 50 wafers
Service Device/System: Metal evaporation process by e-beam
Excluding metal price; 1 evaporation
Service Device/System: Thermal evaporation system
Excluding metal price; unit
Service Device/System: Diffusion furnaces for full-area p and n-type doping
Priced over 10 wafers
Service Device/System: Electroplating
wafer